PZT Spin On Solution
PZT spin on solution is a new way to dramatically cut your PZT coatings costs.
This advanced technology, developed by a Japanese chemical producer, permits to save up to 10 times, compared to a regular sputtering costs.
The new material is produced with spin coater and shows excellent film quality.
PZT Lead Zirconate Titanate material for SPIN Coating
While expectations for the diversification and increased sophistication of functional ceramic thin film are increasing, coating materials are extremely valuable as research materials for initial characterization and evaluation and for exploring possibilities.
The biggest merit of thin film fabrication using coating materials is the low cost of the materials, manufacturing equipment and facilities. The low cost of film-forming using dip coating, for instance, is unrivaled compared to other methods. As a supplier of various types of liquid materials for semiconductors, our supplier , which has grown steadily to obtain a significant share of the market, develops and manufactures other high-quality coating materials using alcoholates for raw material.
Since we develop our products in particularly close collaboration with semiconductor device manufacturers and corporations in related industries, we have extensive experience in everything from materials for research and development to mass production materials.
Characteristics of our coating materials
Our supplier offers two main product groups: Sol-gel materials and MOD materials. Sol-gel materials are hydrolyzedalkoxides or similar materials that are polymerized, formed into colloids and dispersed in a solution. Since they do not contain polymeric materials such as organic acids, and the principal constituents of the solution are themselves precursors of ceramics, they are generally excellent for low-temperature film formation. MOD coating materials are solutions of metallic organic compounds dissolved in organic solvent. This solution is applied to a substrate, and after it dries, it is heated. This is a simple method of forming a thin oxide film. Our supplier offers his own MOD coating materials, as well as EMOD coating materials.
The MOD coating materials from our supplier offer particularly good wetting of the substrate, and they are prepared to enable simple application to all kinds of wafers, SiO2, glass and other substrates using methods such as spin coating, dip coating and so on. In addition, we have extensive experience in a range of customized products such as various single-metal oxides and compound oxides, and trace element doping among other products.
The EMOD (Enhanced Metal Organic Decomposition) materials offered by our supplier can be mixed and combined in a variety of different compounds. Since coating materials are solutions, coating materials containing different elements can be prepared and mixed in any proportion of choice, thereby offering a greater degree of freedom in research. On the other hand, depending on the combinations mixed, precipitates may form or the viscosity may increase, making them unsuitable for practical application. EMOD materials were developed by our supplier in the 1990s while our supplier developed the process for mass producing these materials, ensuring regular high quality and developing a lineup of products. The coating materials are for making single-metal oxide films of each kind, and they are available for all the elements. Problems during mixing have been minimized, and they feature the ability to be mixed and prepared in most combinations. They have been used over the past dozen years or so in a wide range of research laboratories.
Quality of deposition
Generally, when using coating materials, there is a correlation between the quality of deposition of the thin film obtained andthe coating materials or the conditions of use. Know-how concerning the coating and heat treatment and selection of the material and firing temperature have a strong influence on the quality of the deposition. Organic matter resolves at 400～600˚C, while high quality crystallization is said to occur at about 600～800˚C. Optimization should be possible if attention is paid to compound oxide thin films where the orientation of the crystal axis is considered to be an issue, as well as to the firing conditions and substrate material.
There are two main methods of applying coating materials to substrates; the spin coating method and the dip coating method.
It is possible to adjust the concentration of the coating using a dilution agent. You can use coating materials optimally suited to the desired application, concentration and coating method. If you require coating materials that achieve excellent characteristics, with compound oxide thin films formed with mixed preparations of EMOD coating materials and optimal conditions that can obtain stable characteristics and oxide composition required for commercial products, please contact our sales team. We carry out customization of coating materials for improved quality of deposition and the optimal concentration, mixing ratio, and additives to meet your needs.
The ingredients and concentration are not the same as the oxide and oxide content residue after firing.
This means that the concentration indicated will result if the concentration of the solution is calculated as the oxide in the table.
Please contact Alja Plosnik via mail: email@example.com or via Phone: +4237928021